Characterization of CNx Thin Films Synthesized by Laser Ablation Technique
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Published:2009-01
Issue:
Volume:609
Page:265-268
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ISSN:1662-9752
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Container-title:Materials Science Forum
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language:
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Short-container-title:MSF
Author:
Zouadi N.1,
Abdelli-Messaci Samira2,
Gabouze N.1,
Kerdja Tahar2,
Bradai D.3
Affiliation:
1. Unité de Développement de la Technologie du Silicium (UDTS)
2. Centre de Développement des Technologies Avancées
3. USTHB
Abstract
In this work we report the optical characteristics of carbon nitride films produced by a KrF excimer laser ablation technique. The ablated materials were collected on different wafers, glass and porous silicon for different N2 pressures (0.1-0.5mbar). The thin films were synthesized at room temperature. The deposited thin films were characterized by spectrophotometry, ellipsometry, scanning electron microscopy (SEM) and Fourier Transform Infrared Spectroscopy (FTIR). The results show that the optical band gap deduced from optical transmission spectra in the ultraviolet- visible – near infrared range increases with deposition time and with nitrogen pressures increasing. SEM observation indicates that the CNx film is granular. Finally, FTIR spectra reveal carbon nitride absorption bands which do not seem change considerably with N2 pressures.
Publisher
Trans Tech Publications, Ltd.
Subject
Mechanical Engineering,Mechanics of Materials,Condensed Matter Physics,General Materials Science
Cited by
1 articles.
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