Deep Defects in 3C-SiC Generated by H+- and He+-Implantation or by Irradiation with High-Energy Electrons

Author:

Weidner Michael1,Trapaidze Lia1,Pensl Gerhard1,Reshanov Sergey A.2,Schöner Adolf2,Itoh Hisayoshi3,Ohshima Takeshi4,Kimoto Tsunenobu5

Affiliation:

1. Friedrich-Alexander-Universität Erlangen-Nürnberg

2. Acreo AB

3. Japan Atomic Energy Agency

4. QST

5. Kyoto University

Abstract

Intrinsic defects in 3C-SiC are generated by implantation of H+- and He+-ions or irra¬diation with high energy electrons. The defect parameters and the thermal stability of the observed defects are determined. The capture-cross-section of the W6-center is directly measured by variation of the filling pulse length. The charge state of the W6-center is obtained from double-correlated DLTS investigations according to the Poole-Frenkel effect.

Publisher

Trans Tech Publications, Ltd.

Subject

Mechanical Engineering,Mechanics of Materials,Condensed Matter Physics,General Materials Science

Cited by 2 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. Deep levels in tungsten doped n-type 3C–SiC;Applied Physics Letters;2011-04-11

2. Chloride Based CVD of 3C-SiC on (0001) α-SiC Substrates;Materials Science Forum;2011-03

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