1360 V, 5.0 mΩcm2 Double-Implanted MOSFETs Fabricated on 4H-SiC(000-1)

Author:

Kono Hiroshi1,Suzuki Takuma2,Mizukami Makoto2,Ota Chiharu2,Harada Shinsuke3,Senzaki Junji3,Fukuda Kenji3,Shinohe Takashi2

Affiliation:

1. Corporate R&D Center, Toshiba Corporation

2. Toshiba Corporation

3. National Institute of Advanced Industrial Science and Technology (AIST)

Abstract

Silicon carbide Double-Implanted Metal-Oxide-Semiconductor Field-Effect Transistors (DIMOSFETs) were fabricated on 4H-SiC (000-1) carbon face. The DIMOSFETs were characterized from room temperature to 250°C. At room temperature, they showed a specific on-resistance of 4.9 mΩcm2 at a gate bias of 20 V and a drain voltage of 1.0 V. The specific on-resistance taken at a drain current (Id) of 260 A/cm2 was 5.0 mΩcm2. The blocking voltage of this device was higher than 1360 V at room temperature. At 250°C, the specific on-resistance increased from 5.0 mΩcm2 to 12.5 mΩcm2 and the threshold voltage determined at Id = 26 mA/cm2 decreased from 5.5 V to 4.3 V.

Publisher

Trans Tech Publications, Ltd.

Subject

Mechanical Engineering,Mechanics of Materials,Condensed Matter Physics,General Materials Science

Cited by 2 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. 14.6 mΩcm2 3.3 kV DIMOSFET on 4H-SiC (000-1);Materials Science Forum;2014-02

2. 1.4kV Double-Implanted MOSFETs Fabricated on 4H-SiC(000-1);Materials Science Forum;2011-03

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