Advances in Liquid Phase Conversion of (100) and (111) Oriented Si Wafers into Self-Standing 3C-SiC

Author:

Zielinski Marcin1ORCID,Portail Marc2,Chassagne Thierry1,Juillaguet Sandrine3,Peyre Hervé4,Leycuras André5,Camassel Jean4

Affiliation:

1. NOVASiC

2. Centre de Recherche sur l’Hétéro-Epitaxie et ses Applications CNRS

3. Université Montpellier 2 and CNRS

4. Université Montpellier 2

5. Centre de Recherche sur l'Hétéroépitaxie et ses Applications (CRHEA), CNRS

Abstract

We report on recent advances in liquid phase epitaxial (LPE) conversion of a bulk Si wafer into self standing 3C-SiC. This includes the role of the stress control within the (100) oriented “crucibles”, the elaboration of crack-free (111) “crucibles” and the successful conversion of (100) and (111) oriented Si wafer. To date up to 100µm thick 3C-SiC(100) as well as 30µm thick crack-free 3C-SiC (111) materials have been obtained. The growth rate ranges from 20 to 100µm/h and locally can even reach ~1mm/h. In this work we focus on the structural, morphological and optical properties of the LPE-grown material.

Publisher

Trans Tech Publications, Ltd.

Subject

Mechanical Engineering,Mechanics of Materials,Condensed Matter Physics,General Materials Science

Cited by 2 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. Liquid‐Phase Epitaxy;digital Encyclopedia of Applied Physics;2023-01-18

2. Investigation of 3C-SiC growth on Si(111) by vapor–liquid–solid transport using a SiGe liquid phase;Journal of Crystal Growth;2012-09

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