SiC Epitaxial Growth on Multiple 100-mm Wafers and its Application to Power-Switching Devices

Author:

Burk Albert A.1,O'Loughlin Michael J.1,Sumakeris Joseph J.2,Hallin C.1,Berkman Elif1,Balakrishna Vijay3,Young Jonathan1,Garrett Lara1,Irvine Kenneth G.1,Powell Adrian R.2,Khlebnikov Y.2,Leonard R.T.2,Basceri C.1,Hull Brett A.4,Agarwal Anant K.4

Affiliation:

1. Cree, Incorporation

2. Cree Research, Inc.

3. Cree Incorporation

4. Cree, Inc.

Abstract

The development of SiC bulk and epitaxial materials is reviewed with an emphasis on epitaxial growth using high-throughput, multi-wafer, vapor phase epitaxial (VPE) warm-wall planetary reactors. It will be shown how the recent emergence of low-cost high-quality 100-mm diameter epitaxial SiC wafers is enabling the economical production of advanced wide-bandgap Power–Switching devices.

Publisher

Trans Tech Publications, Ltd.

Subject

Mechanical Engineering,Mechanics of Materials,Condensed Matter Physics,General Materials Science

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