Fabrication of CoPt Nanodot Array with a Pitch of 33 nm Using Pattern-Transfer Technique of PS-PDMS Self-Assembly

Abstract

The progress of information technology has increased the demand of the capacity of storage media. Bit patterned media (BPM) has been known as a promising method to achieve the magnetic-data-storage capability of more than 1 Tb/in.2. In this work, we demonstrated fabrication of magnetic nanodot array of CoPt with a pitch of 33 nm using a pattern-transfer method of block copolymer (BCP) self-assembly. Carbon hard mask (CHM) was adopted as a mask to pattern-transfer self-assembled nanodot array formed from poly (styrene)-b-poly (dimethyl siloxane) (PS-PDMS) with a molecular weight of 30,000-7,500 mol/g. According to our experiment results, CHM showed its high selectivity against CoPt in Ar ion milling. Therefore, this result boosted the potential of BCP self-assembly technique to fabricate magnetic nanodot array for the next generation of hard disk drive (HDD) due to the ease of large-area fabrication, and low cost.