Abstract
Films of titanium dioxide (TiO2) were deposited by aerosol deposition at room temperature. Anatase TiO2 powders were used. The crystal structure of these films was a mixture of the anatase and brookite TiO2 phases, while the rutile TiO2 phase was observed at high carrier gas flow rates. The TiO2 film thickness increased in proportion with the scan time and the carrier gas flow rate. Film thickness was constant at constant total deposition times. Flake-like and mesh-like surface morphologies were observed on the films. The direct-current resistivity was estimated from the dielectric constant and the loss tangent; it was found to be much smaller than that of bulk TiO2. We speculate that this low resistivity is due to reduction of TiO2 particles during room-temperature impact consolidation in a N2 atmosphere.
Publisher
Trans Tech Publications, Ltd.
Subject
Mechanical Engineering,Mechanics of Materials,General Materials Science
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