A Review on Fabrication Methods of BiFeO3 Thin Films

Abstract

BiFeO3 is a very promising multiferroic materials, which can present ferroelectric and antiferromagnetic properties at room temperature (Tn=643 K, Tc= 1103 K). Because the fabrication methods of BiFeO3 films play a significant role on their properties, various processing techniques have been developed in recent years for the preparation of such films. In this paper, the main fabrication processes on BiFeO3 thin films were reviewed, including two important chemical processes, chemical solution deposition and metal-organic chemical vapor deposition, and two commonly applied physical processes, pulsed laser deposition and radio-frequency magnetron sputtering.