Investigations of Lead-Free Glasses for Post-Fired and Embedded Thick Film Resistors

Author:

Fu Shen Li1,Hsi Chi Shiung2,Kang Chun Yueh1,Chen Hua Pin1,Wang Siou Jyun2

Affiliation:

1. I-Shou University

2. National United University

Abstract

Lead-free thick film resistors (TFRs) were prepared by mixing of ruthenium oxide (RuO2) and CaO-B2O3-SiO2 based-glass. The resistors were post-fired on alumina and co-fired in LTCC substrates. Different metal oxides were added into the glass phase, such as Nb2O5, MnO2, MoO3, Fe2O3, TiO2. They were used as temperature coefficient of resistor (TCR) adjustment agents of the resistors. The microstructures variations and interactions at the interface between resistors and substrates were investigated. The additives made glass structure loose and conductivity of resistor decrease, the TCR values of the resistors moved toward negative direction. When 4wt% MnO2 was added into the glass, the thick-film resistors embedded in LTCC had conductivity of 2.46 (Ω-cm)-1, the temperature coefficient of resistor decreased to 12 ppm/°C. The conductivities of the resistors films were depended on the volume fractions of conductor-agglomeration (RuO2), microstructures, and TCR additives of the resistor layers

Publisher

Trans Tech Publications, Ltd.

Subject

Mechanical Engineering,Mechanics of Materials,General Materials Science

Reference11 articles.

1. D. W. Hamer and J. V. Biggers, Thick Film Hybrid Microcircuit Technology. Wiley, New York, (1972).

2. S. Vasudevan and R. W. Vest, The Effect of Conductive Particle Size on the Temperature Dependence of Resistance in RuO2 Thick Film Resistors,; p.415–25 in Ceramic Transactions, Vol. 11, Ceramic Thin and Thick Films. Edited by B. V. Hiremath. American Ceramic Society, Westerville, OH, (1990).

3. K. -M. Yi, K. -W. Lee, and K. -W. Chung, J. Mater. Sci.: Mater. Electron., Vol. 8 (1997) , p.247–51.

4. T. Inokuma, Y. Taketa, and M. Haradome, IEEE Trans. Compon., Hybrids, Manuf. Technol., Vol. CHMT-8(1985), p.372–73.

5. K. Adachi, S. Iida, and K. Hayashi, J. Mater. Res., Vol. 9(1994), p.1866–78.

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线,采集、加工和组织学术论文而形成的新型学术文献查询和分析系统,可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容,当前同舟云学术共收录了国内外主流学术期刊6万余种,收集的期刊论文及会议论文总量共计约1.5亿篇,并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询!咨询电话:010-8811{复制后删除}0370

www.globalauthorid.com

TOP

Copyright © 2019-2024 北京同舟云网络信息技术有限公司
京公网安备11010802033243号  京ICP备18003416号-3