Investigation of Ni/Al/Ti Ohmic Contact on N-Type 4H-SiC-Reference-Cited by-同舟云学术

Investigation of Ni/Al/Ti Ohmic Contact on N-Type 4H-SiC

Published:2021-09-06 Issue: Volume:1045 Page:186-193
ISSN:1662-9752
Container-title:Materials Science Forum
language:
Short-container-title:MSF

Author:

Xue Meng Qian¹,Wan Cai Ping²,Ge Nian Nian²,Xu Heng Yu²

Affiliation:

1. University of Chinese Academy of Sciences

2. Chinese Academy of Sciences

Abstract

In order to understand the contribution of various metals in the formation of ohmic contacts, Ni/Al/Ti ohmic contacts on n-type 4H-SiC in terms of a different annealing temperature and Ti composition are investigated, which is more difficult to form than p-type ohmic contact. The formation of the Ni/Al/Ti metal alloy system is much more sensitive to metal composition than annealing conditions. With the increase of metal composition, the contact with a high Ti content yields a lower specific contact resistivity compared with the low Ti contact. The annealed surface morphology and phase resultants were examined by scanning electron microscopy (SEM) and atomic force microscope (AFM), respectively. With the increase of Ti components, the surface morphology of the samples becomes more uniform and smoother, while the surface roughness remains unchanged. It implies that Ti metal can not only reduce the ohmic resistance, but also protect the surface of the sample and maintain the roughness.

Publisher

Trans Tech Publications, Ltd.

Subject

Mechanical Engineering,Mechanics of Materials,Condensed Matter Physics,General Materials Science

Link

https://www.scientific.net/MSF.1045.186.pdf

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