Abstract
Nanocrystalline vanadium oxide thin films have been deposited by reactive DC
magnetron sputtering onto glass substrates under different processing conditions. Structural analysis
and phase identification have been carried out by means of X-ray diffractometry (XRD). The
surface morphologies of the different films have been examined by both scanning electron
microscopy (SEM) and atomic force microscopy (AFM). The XRD results revealed single and
multiple phase oxides such as VO2(B), VO2(M), V2O5, etc. with considerable differences
concerning to surface morphologies, as observed by SEM and AFM. The effects the O2/Ar flow
ratio, DC current, and working pressure on the phases formed and growth rates is discussed.
Moreover, VO2(M) films exhibited different morphologies concerning to grain size and shape as
well as dissimilar preference in crystal orientation, as a result of the processing conditions. The
optical/thermochromic response of the VO2(M) specimens deposited under different growth rate
conditions was evaluated by optical spectrophotometry and related to the respective structural
characteristics.
Publisher
Trans Tech Publications, Ltd.
Cited by
20 articles.
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