Effect of Deposition Temperature on the Structure and Mechanical Properties of Ti-6Al-4V Film

Abstract

Ti-6Al-4V films were deposited by direct-current magnetron sputtering at different substrate temperatures. The structure and the surface morphology of the films were characterized by X-ray diffraction (XRD) and scanning electron microscopy (SEM). The hardness and elastic moduli of Ti-6Al-4V films were measured by nanoindentation test. The results showed that the phase direction of the films deposited at room temperature was (102) orientation, and turned to almost complete (002) preferred orientation at 300°C. For a higher temperature of 500°C, the preferred orientation of the film disappeared and presented a random grain orientation. The hardness and elastic moduli of Ti-6Al-4V films obviously showed the dependence on the temperature. The relationships among temperature, microstructure and mechanical properties of Ti-6Al-4V films were discussed in this paper.