Texture and Magnetism of Nanocrystalline Ni Films and Multilayers

Abstract

Nickel films are grown by radio frequency magnetron sputtering on Corning glass, polyimide foils and on the native oxide of Si (100) wafers at low (1x10-3 mbar) and relatively high (2.5x10-2 mbar) Argon pressure at 100 °C. The base pressure of the high vacuum chamber is 1x10-7 mbar. X-ray diffraction experiments are performed to reveal the different texture of various Ni films. Magneto-optical Kerr effect hysteresis loops and magnetic force microscopy images show correlation between Argon pressure, texture and magnetic anisotropy of the films. The results are discussed with respect to relevant measurements of Ni/NiO magnetic multilayers prepared under similar experimental conditions.