Effect of Diffusion Barrier and Impurities in Titanium on the Growth Rate of TiAl<sub>3</sub> Layer-Reference-Cited by-同舟云学术

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Effect of Diffusion Barrier and Impurities in Titanium on the Growth Rate of TiAl₃ Layer

Published:1997-01 Issue: Volume:143-147 Page:591-596
ISSN:1662-9507
Container-title:Defect and Diffusion Forum
language:
Short-container-title:DDF

Author:

Shimozaki Toshitada¹,Okino Takahisa²,Yamane Masayuki,Wakamatsu Y.¹,Onishi M.¹

Affiliation:

1. Kyushu Institute of Technology

2. Oita University

Publisher

Trans Tech Publications, Ltd.

Subject

Condensed Matter Physics,General Materials Science,Radiation

Link

https://www.scientific.net/DDF.143-147.591.pdf

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