Optimization of Fabrication Process for MEMS Based Microneedles Using ICP Etching Technology

Abstract

In this paper, optimization of fabrication process for microneedles has been presented. Using inductively coupled plasma (ICP) etching technology, fabrication of out-of-plane hollow silicon microneedles for blood extraction has been carried out. Sharp tip microneedles with length 1100 µm were designed for fabrication. The fabrication of microneedles was not successful because the lumen section was fabricated first and then hole was created for fluid flow. Previously, using same fabrication method successful fabrication of microneedles was done for drug delivery with length 200 µm. This fabrication method is not suitable for long structure. Thus, the alternative microneedle fabrication steps using ICP etching have been developed and presented in this paper. These steps can be more optimized and suitable for sharp tip, long and hollow structure.