Effect of Deposition Temperature on Surface Roughness of Nanocrystalline Diamond Film

Author:

Dai Wen Qi1,Wang Lin Jun1,Huang Jian1,Liu Yi Feng1,Tang Ke1,Xia Yi Ben1

Affiliation:

1. Shanghai University

Abstract

Nanocrystalline diamond (NCD) films were synthesized by hot-filament chemical vapor deposition (HFCVD) method at different temperatures (600 °C, 620°C, 640°C and 660°C). The AFM and Raman analyses demonstrated that deposition temperature has a great effect on the surface roughness and quality of NCD films and 620°C is the temperature to grow NCD films with smooth surfaces.

Publisher

Trans Tech Publications, Ltd.

Subject

General Engineering

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