A Review on Mechanical Properties of Freestanding Diamond Films

Author:

Hei Li Fu1,Lu Fan Xiu1,Li Cheng Ming1,Tang Wei Zhong1,Chen Guang Chao2,Song Jian Hua1

Affiliation:

1. University of Science and Technology Beijing

2. Chinese Academy of Science

Abstract

As an emerging brand new type of engineering material for a variety of important high technology applications, the deep understanding of the mechanical behavior of freestanding diamond films has become an emergent task of vital importance. Of the many deposition methods dc arc plasma jet has been regarded as the most promising technique for large area high quality and low cost production of freestanding diamond films. In the present paper, recent progress in mechanical properties of freestanding diamond films mainly by high power dc arc plasma jet with rotating arc root and gas recycling is reviewed. Testing methods for fracture strength and fracture toughness are discussed. Experimental data are presented and compared to that by MWCVD. Dc arcjet diamond films start to oxidize at about 700°C, however, oxidation up to 800°C for 10 min does not affect the fracture strength. Fracture mechanism is discussed. The strange mechanical behavior of freestanding diamond films is explained. It is surprising that CVD diamond film is such a kind of material which is strong, but full of different size of defects. It is hoped that the present paper will be helpful for those who wish to understand and use this brand new type of engineering material.

Publisher

Trans Tech Publications, Ltd.

Subject

General Engineering

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