INFLUENCE OF THE STATE OF THE YSZ TARGET ON ITS SPUTTERING RATE DURING DEPOSITION OF A TBC CERAMIC LAYER BY THE UOKS-3 UNIT

Abstract

The paper considers the operational features of the UOKS-3 magnetron sputtering system. The experimentally obtained data indicate that the sputtering rate of the substrate depends on a large number of factors, such as partial pressure of the working and reaction gases, distance between the target and the workpieces, and depth of the groove made on the working surface of the target. Using a comprehensive study of the influence of each of these factors, it is possible to more accurately predict the deposition rate of a ceramic layer of a thermal barrier coating on the surface of the processed products.