Development of high-yield fabrication technique for MEMS-PhC devices-Reference-Cited by-同舟云学术

Development of high-yield fabrication technique for MEMS-PhC devices

Published:2006 Issue:3 Volume:3 Page:39-43
ISSN:1349-2543
Container-title:IEICE Electronics Express
language:en
Short-container-title:IEICE Electron. Express

Author:

Higo A.¹²,Iwamoto S.¹³,Ishida S.¹³,Arakawa Y.¹³,Tokushima M.⁴,Gomyo A.⁴,Yamada H.⁴,Fujita H.¹,Toshiyoshi H.¹²

Affiliation:

1. Institute of Industrial Science, The University of Tokyo

2. Kanagawa Academy of Science & Technology

3. Research Center of Advanced Science and Technology, The University of Tokyo

4. Fundamental and Environmental Research Laboratories, NEC Corporation

Publisher

Institute of Electronics, Information and Communications Engineers (IEICE)

Subject

Electrical and Electronic Engineering,Condensed Matter Physics,Electronic, Optical and Magnetic Materials

Link

http://www.jstage.jst.go.jp/article/elex/3/3/3_3_39/_pdf

Reference9 articles.

1. [1] E. Yablonovitch, J. Opt. Soc. Am. B, vol. 10, p. 283, 1993.

2. [3] A. Higo, S. Iwamoto, S. Ishida, H. Fujita, Y. Arakawa, H. Toshiyoshi, A. Gomyo, M. Tokushima, and H. Yamada, “Design and Fabrication of MEMS Optical Modulators Integrated with PhC Waveguides, ”IEEE/LEOS Optical MEMS 2005, G4, pp. 113-114, 2005.

3. [4] R. Dangel and W. Lukosz, “Electro-Nanomechanically Activated Integrated-Optical Interferometric Switches, ”OSA Technical Digest Series, vol. 10, pp. 2-4, April 1997.

4. [5] T. Takahata, K. Hoshino, K. Matsumoto, and I. Shimoyama, “Photonic Crystal Tuned by Cantilever, ”IEEE Int. Conf. Micro Electro Mechanical Syst. 2005, WP15, 2005.

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