Polymorphous Silicon: A Promising Material for Thin-Film Transistors for Low-Cost and High-Performance Active-Matrix OLED Displays

Author:

TEMPLIER François1,BROCHET Julien1,AVENTURIER Bernard1,COOPER David1,ABRAMOV Alexey2,DAINEKA Dmitri2,CABARROCAS Pere ROCA i2

Affiliation:

1. CEA-LETI Minatec

2. LPICM, Ecole Polytechnique, CNRS

Publisher

Institute of Electronics, Information and Communications Engineers (IEICE)

Subject

Electrical and Electronic Engineering,Electronic, Optical and Magnetic Materials

Reference9 articles.

1. Microcrystallinity of Undoped Amorphous Silicon Films and Its Effects on the Transfer Characteristics of Thin-Film Transistors

2. Stable microcrystalline silicon thin-film transistors produced by the layer-by-layer technique

3. Study of the Drain Leakage Current in Bottom-Gated Nanocrystalline Silicon Thin-Film Transistors by Conduction and Low-Frequency Noise Measurements

4. [4] F. Templier, M. Oudwan, F. Sermet, A. Abramov, and P. Roca i Cabarrocas, “Improvement of threshold voltage stability with bottom-gate polymorphous silicon thin film transistors,” Proc. ITC 07/SID-ME Spring Meeting 2007, Rome, Italy, Jan. 2007.

5. [5] J. Brochet, M. Oudwan, D. Daineka, P. Roca i Cabarrocas, and F. Templier, “Electrical characterization of polymorphous thin-film transistors for application to active-matrix OLED displays,” Proc. International Thin-Film Transistor Conference 2009 (ITC'09)/SID-ME Spring Meeting 2009, pp.157-160, Palaiseau, France, March 2009.

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