A 0.15-µm FD-SOI Substrate Bias Control SRAM with Inter-Die Variability Compensation Scheme

Author:

OKUMURA Shunsuke1,FUJIWARA Hidehiro1,YAMAGUCHI Kosuke1,YOSHIMOTO Shusuke1,YOSHIMOTO Masahiko1,KAWAGUCHI Hiroshi1

Affiliation:

1. Kobe University

Publisher

Institute of Electronics, Information and Communications Engineers (IEICE)

Subject

Electrical and Electronic Engineering,Electronic, Optical and Magnetic Materials

Reference13 articles.

1. [1] International Technology Roadmap for Semiconductors (ITRS) Report, 2009.

2. [2] S. Mukhopadhyay, K. Kim, H. Mahmoodi, A. Datta. D. Park, and K. Roy, “Self-repairing SRAM for reducing parametric failures in nanoscaled memory,” Symposium on VLSI Circuits Digest of Technical Papers, pp.132-133, July 2006.

3. SRAM Circuit With Expanded Operating Margin and Reduced Stand-By Leakage Current Using Thin-BOX FD-SOI Transistors

4. 90-nm Process-Variation Adaptive Embedded SRAM Modules With Power-Line-Floating Write Technique

5. [5] S. Sundarswaran, J.A. Abraham, A. Ardelea, and R. Panda, “Characterization of standard cell technology,” Ninth International Symposium on Quality of Design, 2008, ISQED 2008, pp.213-219, March 2008.

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