1.3-.MU.m InGaAlAs-BH laser with Cl2/N2 ECR plasma etched mesas

Author:

Uchiyama Hiroyuki1,Sato Hiroshi1,Shinoda Kazunori1,Taike Akira1,Taniguchi Takafumi1,Tsuji Shinji1

Affiliation:

1. Central Research Laboratory, Hitachi Ltd.

Publisher

Institute of Electronics, Information and Communications Engineers (IEICE)

Subject

Electrical and Electronic Engineering,Condensed Matter Physics,Electronic, Optical and Magnetic Materials

Reference12 articles.

1. High-performance uncooled 1.3-μm Al/sub x/Ga/sub y/In/sub 1-x-y/As/InP strained-layer quantum-well lasers for subscriber loop applications

2. InGaAs/InGaAlAs MQW lasers with InGaAsP guiding layers grown by gas source molecular beam epitaxy

3. [3] P. J. A. Thijs, T. van Dongen, J. J. M. Binsma, and E. J. Jansen, “High performance buried heterostructure 1.5µm InGaAs/AlGaInAs strained-layer quantum well lasers diodes, ” Proc. Indium Phosphide and Related Materials, pp. 765-768, 1996.

4. [4] T. Tanbun-Ek, S. N. G. Chu, P. W. Wisk, R. Pawelek, A. M. Sergent, J. Minch, E. Young, and S. L. Chuang., “High performance buried heterostructure 1.55µm wavelength AlGaInAs/InP multiple quantum well lasers grown entirely by MOVPE technique, ” Proc. Indium Phosphide and Related Materials, pp. 702-705, 1998.

5. 1.3-μm AlGaInAs buried-heterostructure lasers

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