Analysis of Dislocation Density for GaN Based HEMTs in Screw Mod
Author:
BAYAL Özlem1ORCID, BALCI Esra2ORCID, BILGILI Ahmet Kursat3ORCID, ÖZTÜRK Mustafa3ORCID, ÖZÇELİK Süleyman3ORCID, ÖZBAY Ekmel4ORCID
Affiliation:
1. GAZİ ÜNİVERSİTESİ 2. ANKARA HACI BAYRAM VELI UNIVERSITY 3. GAZI UNIVERSITY 4. BILKENT UNIVERSITY
Abstract
Quick response is an important feature in design of optoelectronic cards. So in this study, structural properties of GaN/AlN/AlGaN HEMTs structures grown on sapphire by the chemical vapor adjustment method are analyzed by the X-ray diffraction method. The main property of these kind of materials is that they are resistant to high voltage, temperature, and pressure. Although their performance is worse compared silicon, for forcing limit standards, they present wide research field. In this study, the focus of investigation is dislocation density stemming from lattice mismatch between layers and wafer causing cracks on the surface. In HEMT structure calculation of dislocation density for GaN and AlN represents all structure. High dislocation density for AlN layer is determined because of aggressive behavior of Al element in the structure. Also, quantized GaN layers stop moving of dislocations and prevents surface cracks.
Funder
Presidency Strategy and Budget Directorate
Publisher
Gazi University
Reference18 articles.
1. Bayrak, S. T. (2003) AlxGa1-xN/GaN hetero yapılardaki 2BEG’nın elektriksel ve optiksel karakterizasyonu MSc Thesis, Balıkesir University. 2. Bernardini, F., Fiorentini, V., & Vanderbilt, D. (1997). Spontaneous polarization and piezoelectric constants of III-V nitrides Physical Review B, 56(16), R10024. doi:10.1103/PhysRevB.56.R10024 3. Bilgili, A. K., Çağatay, R., Öztürk, M. K., & Özer, M. (2022). Investigation of Electrical and Structural Properties of Ag/TiO2/n-InP/Au Schottky Diodes with Different Thickness TiO2 Interface. Silicon, 14(6), 3013-3018. doi:10.1007/s12633-021-01093-5 4. Chen, Y., Liu, J., Zeng, M., Lu, F., Lv, T., Chang, Y., Lan, H., Wei, B., Sun, R., Gao, J., Wang, Z., & Fu, L. (2020). Universal growth of ultra-thin III–V semiconductor single crystals. Nature Communications, 11(1), 3979. doi: 10.1038/s41467-020-17693-5 5. Elhamri, S., Newrock, R. S., Mast, D. B., Ahoujja, M., Mitchel, W. C., Redwing J. M., Tischler, M. A., & Flynn, J. S. (1998). Al0.15Ga0.85N/GaN heterostructures: Effective mass and scattering times. Physical Review B, 57(3), 1374-1377. doi:10.1103/PhysRevB.57.1374
|
|