The Attitude of ZnO/Al2O3 Film Produced by Ultrasonic Spray Pyrolysis Under Thermal Annealing
-
Published:2022-12-30
Issue:
Volume:
Page:
-
ISSN:2147-9526
-
Container-title:Gazi Üniversitesi Fen Bilimleri Dergisi Part C: Tasarım ve Teknoloji
-
language:en
-
Short-container-title:GUJS Part C
Author:
POLAT GÖNÜLLÜ Meryem1, ÇAKIL Damla Dilara2, ÇETİNKAYA Cemil3
Affiliation:
1. GAZİ ÜNİVERSİTESİ, TEKNOLOJİ FAKÜLTESİ, METALURJİ VE MALZEME MÜHENDİSLİĞİ BÖLÜMÜ 2. GAZI UNIVERSITY, FACULTY OF TECHNOLOGY, DEPARTMENT OF METALLURGICAL AND MATERIALS ENGINEERING 3. GAZI UNIVERSITY, FACULTY OF TECHNOLOGY, DEPARTMENT OF METALLURGICAL AND MATERIALS ENGINEERING, METALLURGICAL AND MATERIALS ENGINEERING PR.
Abstract
Impact of annealing on structural, morphological, elemental, and optical properties of bilayer ZnO/Al2O3 film has been investigated. Bilayer film has been deposited on microscope slides by ultrasonic spray pyrolysis method at 350°C substrate temperature. Then, this film has been annealed at 400°C, 500°C, and 600°C under atmospheric conditions, respectively. Structural analyses have been revealed that bilayer films have polycrystalline with hexagonal wurtzite structures of ZnO. Also, there is no other structures have been found like Zn-Al etc. Morphological and elemental analyses have been presented that the alterations of surface, and diffusions of Al to ZnO layer. Cross-sectional images have been revealed the film thickness between 0,78-1.56 m. Optical method have been used for calculation of optical band gap values of the films which are found between 3.17-3.25 eV. The results revealed that annealing leads to diffusion from the bottom layer Al2O3 of the material to the upper layer, ZnO. In addition, it was determined that the as-deposited ZnO/Al2O3 film is still leading in terms of the investigated properties.
Publisher
Gazi Universitesi Fen Bilimleri Dergisi Part C: Tasarim ve Teknoloji
Reference35 articles.
1. [1] Rowlette, P. C., Wolden, C. A., Pulsed plasma-enhanced chemical vapor deposition of Al2O3–TiO2 nanolaminates, Thin Solid Films, 518(3337-3341), (2010). 2. [2] Khan, M. I., Imran, S., Saleem, M., Rehman, S. U., Annealing effect on the structural, morphological and electrical properties of TiO2/ZnO bilayer thin films. Results in physics, 8(249-252), (2018). 3. [3] Besleaga, C., Stan, G. E., Galca, A. C., Ion, L., Antohe, S., Double layer structure of ZnO thin films deposited by RF-magnetron sputtering on glass substrate. Applied surface science, 258(8819-8824) (2012). 4. [4] Yadav, H. M., and Kim, J. S., Fabrication of SiO2/TiO2 double layer thin films with self-cleaning and photocatalytic properties. Journal of Materials Science: Materials in Electronics, 27(10082-10088) (2016). 5. [5] Lin, C. Y., Chen, J. G., Feng, W. Y., Lin, C. W., Huang, J. W., Tunney, J. J., Ho, K. C., Using a TiO2/ZnO double-layer film for improving the sensing performance of ZnO based NO gas sensor. Sensors and Actuators B: Chemical, 157(361-367) (2011).
|
|