Author:
Kawasaki Hiroharu,Ohshima Tamiko,Yagyu Yoshihito,Ihara Takeshi,Mitsuhashi Kazuhiko,Nishiguchi Hiroshi,Suda Yoshiaki
Abstract
Abstract
Functional thin films with a compositional gradient were deposited by a sputtering method with mixed powder targets. The composition ratio of nickel (Ni) and stainless steel (SUS304) was varied over the film thickness using several types of nickel oxide and stainless steel mixed powder targets. Our results indicate that mixed nickel-doped stainless-steel thin films were successfully prepared on both stainless-steel and Si substrates and the mixing ratio was controlled by the composition of the nickel oxide and stainless steel mixed powder.
Subject
General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering
Reference30 articles.
1. Applications of sputtering to the deposition of films;Maissel,1970
2. The nature of physical sputtering;Wehner,1970
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