DC vacuum arc deposition system with an anode generating magnetic field for preparation of TiN films

Abstract

Abstract In this study, a coiled anode that generates a magnetic field using a DC arc was designed and employed in a cathodic vacuum-arc deposition system. Its performance was evaluated by the formation of TiN films with and without a magnetic field. When the magnetic field was applied by the coiled anode, the deposition rate was approximately 1.5 times faster than that without the magnetic field. In addition, a reduction in the number of droplets with films of the same thickness was expected. Furthermore, the hardness of the film was improved by approximately 10% with the magnetic field of the coiled anode, resulting in a very hard film of 43.7 GPa. These results suggest that the coiled anode is effective in reducing the number of droplets and is promising for the formation of super-hard films, which are preferred for cutting tools.