Use of doping to achieve low contact resistance in bottom-gate top-contact type organic transistor with liquid-crystalline organic semiconductor, Ph-BTBT-10

Author:

Takamaru ShunORCID,Hanna Jun-ichi,Iino Hiroaki

Abstract

Abstract We have investigated the characteristics of bottom-gate and top-contact type field effect transistors fabricated with polycrystalline thin films of a liquid-crystalline organic semiconductor, 2-decyl-7-phenyl-benzothienobenzothiophene (Ph-BTBT-10), with a p-type dopant, tetrafluoro-tetracyano-quinodimethane (F4-TCNQ). We found that the contact resistance between the semiconductor and electrode was reduced from 3.0 kΩ cm to 1.2 kΩ cm by contact doping with F4-TCNQ, and to 0.9 kΩcm by subsequent thermal annealing of the films, in which the F4-TCNQ dopant diffused from the surface to the interior of the Ph-BTBT-10 thin film. In addition, we found that contact-doped and thermally annealed devices showed higher mobility and smaller threshold voltage in short-channel devices compared to pristine devices. We conclude that thermal diffusion of dopants to improve FET performance is an important technique.

Publisher

IOP Publishing

Subject

General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering

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