Atomic layer deposition of Y2O3 thin films with a high growth per cycle by Ar multiple boost injection
Author:
Publisher
IOP Publishing
Subject
General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering
Link
https://iopscience.iop.org/article/10.35848/1347-4065/ab87f4/pdf
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5. Electronic and optical properties ofY2SiO5andY2Si2O7with comparisons to α-SiO2andY2O3
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1. Robust formation of ferroelectric HfO2 films by Y2O3 sub-monolayer lamination;Applied Physics Express;2022-11-09
2. HfO2:Y2O3 ultrathin nanolaminate structures grown by ALD: Bilayer thickness and annealing temperature effects on optical properties;Ceramics International;2022-06
3. Cerium oxide capping on Y-doped HfO2 films for ferroelectric phase stabilization with endurance improvement;Japanese Journal of Applied Physics;2022-02-01
4. High field-effect mobility with suppressed negative threshold voltage shift in 4H-SiC MOSFET with cerium oxide interfacial layer;Japanese Journal of Applied Physics;2021-02-08
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