Valley photonic crystal waveguides fabricated with CMOS-compatible process
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Published:2023-08-01
Issue:8
Volume:62
Page:082002
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ISSN:0021-4922
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Container-title:Japanese Journal of Applied Physics
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language:
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Short-container-title:Jpn. J. Appl. Phys.
Author:
Yamaguchi Takuto,Yoshimi Hironobu,Seki Miyoshi,Ohtsuka Minoru,Yokoyama Nobuyuki,Ota Yasutomo,Okano Makoto,Iwamoto Satoshi
Abstract
Abstract
Valley photonic crystal (VPhC) waveguides have attracted much attention because of their ability to enable robust light propagation against sharp bends. However, their demonstration using a CMOS-compatible process suitable for mass production has not yet been reported at the telecom wavelengths. Here, by tailoring the photomask to suppress the optical proximity effect, VPhC patterns comprising equilateral triangular holes were successfully fabricated using photolithography. We optically characterized the fabricated VPhC devices using microscopic optics with NIR imaging. For comparison, we also fabricated and characterized line-defect W1 PhC waveguides, in which the transmission intensities decreased at some regions within the operating bandwidth when sharp turns were introduced into the waveguide. In contrast, the developed VPhC waveguides can robustly propagate light around the C-band telecommunication wavelengths, even in the presence of sharp bends. Our results highlight the potential of VPhC waveguides as an interconnection technology in silicon topological photonic ICs.
Funder
New Energy and Industrial Technology Development Organization
Japan Society for the Promotion of Science
Core Research for Evolutional Science and Technology
Subject
General Physics and Astronomy,General Engineering