Abstract
Abstract
We report on negative bias-enhanced growth of quenched-produced diamond films on titanium using hybrid coaxial arc plasma deposition at room temperature. Optimizing the bias voltage to −40 V resulted in a spontaneous formation of a titanium carbide interfacial layer, which caused a significant increase in the adhesion strength from 16 to 48 N. Selective etching of undesired sp
2–C bonded atoms and ultrafast quenching of the energetic carbon ions (C+) promoted the growth of dense sp
3–C bonded atoms, achieving a superhardness of 96 GPa, comparable to natural diamond. These pioneering findings have the potential to revolutionize multifunctional materials for biomedical applications.
Funder
JSPS KAKENHI
Osawa Scientific Studies Grants Foundation, and JST A-STEP Stage II
Subject
General Physics and Astronomy,General Engineering
Cited by
3 articles.
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