Abstract
Abstract
An ultra-thin AlGaN last quantum barrier (LQB) with a high Al content is effective in enhancing the hole injection in AlGaN-based deep UV LEDs (DUV-LEDs). However, it is very challenging to realize the ultra-thin LQB by the metalorganic chemical vapor deposition technique. In this work, a well-defined 1.0 nm thick AlGaN LQB with unintentionally high Al content was achieved by controlling the surface desorption kinetics for the growth of multiple quantum wells. The light output power of the DUV-LEDs with 1 nm thick LQB was increased by 44% to 7.16 mW at 40 mA, and the peak external quantum efficiency reached 4.04%.
Funder
Guandong Procvince Key-Area R&D Program
Guangdong Basic and Applied Basic Research Foundation
Key R&D Program of JiangSu Province
Jiangxi Science and Technology Program
Natural Science Foundation of China
Scientific and Technological Research Council of Turkey
Strategy Priority Research Program of CAS
Key Research Program of Frontier Sciences, CAS
Suzhou Science and Technology Program
Youth Promotion Association of CAS
JST | Natural Science Foundation of Jiangsu Province
National Key R&D Program of China
CAS Bilateral Cooperation Program
Bureau of International Cooperation, Chinese Academy of Sciences
Subject
General Physics and Astronomy,General Engineering
Cited by
1 articles.
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