MICROSTRUCTURE OF AMORPHOUS COPPER-CARBON THIN FILMS FORMED BY PLASMA-ENHANCED CHEMICAL VAPOR DEPOSITION-Reference-Cited by-同舟云学术

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MICROSTRUCTURE OF AMORPHOUS COPPER-CARBON THIN FILMS FORMED BY PLASMA-ENHANCED CHEMICAL VAPOR DEPOSITION

Published:2016 Issue:2 Volume:20 Page:115-126
ISSN:1093-3611
Container-title:High Temperature Material Processes An International Quarterly of High-Technology Plasma Processes
language:en
Short-container-title:High Temp Mat Proc

Author:

Astashynskaya M. V.,Astashynski Valiantsin V.,Kvasov N. T.,Uglov Vladimir V.

Publisher

Begell House

Subject

Physical and Theoretical Chemistry,Spectroscopy,General Engineering,Energy Engineering and Power Technology,Condensed Matter Physics,General Materials Science

Link

https://dl.begellhouse.com/download/article/5ee0558915c83835/(3)HTM-17797.pdf

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