ANALYSIS OF FORMATION AND COMPOSITION OF BORON-BASED PROTECTIVE COATINGS OBTAINED BY ELECTRON-BEAM DEPOSITION AT FORE-VACUUM PRESSURES

Abstract

We have investigated the process of deposition of protective boron-based thin films by electron-beam evaporation of the solid boron target. The spatial distribution of vapor of the evaporated target, temperature during deposition, and the thickness of the deposited coating have been studied, showing that higher deposition rates, coating thicknesses, and substrate temperatures were achieved at small angles (< 20 degrees) and distances (< 7 cm) between the beam and the target. The study of mass-to-charge composition of the beam-produced plasma, morphology, and the elemental analysis of the deposited coatings have demonstrated the high ratio of boron in plasma and in the coating, which has a high degree of uniformity. These findings open up possibility to use such coatings as a hard, wear-resistant top layer in multilayer combined protective and functional coatings.