PULSED VACUUM ARC PLASMA DEPOSITION OF FILMS AND PARTICLES AT DIFFERENT PRESSURES AND TEMPERATURES-Reference-Cited by-同舟云学术

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PULSED VACUUM ARC PLASMA DEPOSITION OF FILMS AND PARTICLES AT DIFFERENT PRESSURES AND TEMPERATURES

Published:2020 Issue:2 Volume:24 Page:157-165
ISSN:1093-3611
Container-title:High Temperature Material Processes An International Quarterly of High-Technology Plasma Processes
language:en
Short-container-title:High Temp Mat Proc

Author:

Amrenova A. U.,Zhukeshov Anuar M.,Ibraev B. M.,Gabdullina A. T.,Useinov B. M.,Mukhamedryskyzy M.,Fermakhan K.

Publisher

Begell House

Subject

Physical and Theoretical Chemistry,Spectroscopy,General Engineering,Energy Engineering and Power Technology,Condensed Matter Physics,General Materials Science

Link

http://www.dl.begellhouse.com/download/article/39f0044759fb9927/HTM24(2)-7_34924.pdf

Cited by 1 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. An Al and Cu layers with microporous deposited using pulsed arc spraying;Materials Letters;2021-09

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