Real Time Estimation and Control of Oxide-Etch Rate Distribution Using Plasma Emission Distribution Measurements
Author:
Publisher
IOP Publishing
Subject
General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering
Reference4 articles.
1. Deposition control for reduction of 193 nm photoresist degradation in dielectric etching
2. Energy Control of Incident Ions to the Chamber-Wall by Using Push–Pull Bias (Phase-Controlled Bias) in UHF-ECR Etching System
3. Study of gate oxide breakdown caused by charge buildup during dry etching
4. Mechanism of Surface Charging Effects on Etching Profile Defects
Cited by 8 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Deposition profile of ammonium bromide in N2/HBr plasmas for high-aspect-ratio multilayer etching;Japanese Journal of Applied Physics;2019-05-31
2. Progress and perspectives in dry processes for leading-edge manufacturing of devices: toward intelligent processes and virtual product development;Japanese Journal of Applied Physics;2019-05-30
3. Eliminating dependence of hole depth on aspect ratio by forming ammonium bromide during plasma etching of deep holes in silicon nitride and silicon dioxide;Japanese Journal of Applied Physics;2018-05-11
4. Effect of temperature on deposition layer formation in HBr/N2/fluorocarbon-based plasma;Japanese Journal of Applied Physics;2017-05-11
5. Role of surface-reaction layer in HBr/fluorocarbon-based plasma with nitrogen addition formed by high-aspect-ratio etching of polycrystalline silicon and SiO2stacks;Japanese Journal of Applied Physics;2016-05-24
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3