Relationship between Resistivity and Structure of Photosensitive Organic Silsesquioxanes by Impedance Spectroscopy and Solid-State29Si Nuclear Magnetic Resonance-Reference-Cited by-同舟云学术

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Relationship between Resistivity and Structure of Photosensitive Organic Silsesquioxanes by Impedance Spectroscopy and Solid-State29Si Nuclear Magnetic Resonance

Published:2008-02-15 Issue:2 Volume:47 Page:1377-1381
ISSN:0021-4922
Container-title:Japanese Journal of Applied Physics
language:en
Short-container-title:Jpn. J. Appl. Phys.

Author:

Kusaka Yasunari,Nakamura Shigeru,Azuma Kenichi,Sasaki Taku,Unate Takao,Nakatani Yasuhiro,Nakasuga Akira,Matsukawa Kimihiro,Watanabe Naoki,Naito Hiroyoshi,Kaji Hironori

Publisher

IOP Publishing

Subject

General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering

Reference6 articles.

1. New positive-type photosensitive polyimide having sulfo groups

2. Photosensitive poly(benzoxazole) based on precursor from diphenyl isophthalate and bis(o-aminophenol)

3. Ultraviolet induced transformation of polysiloxane films

4. Enabling Gate Dielectric Design for All Solution-Processed, High-Performance, Flexible Organic Thin-Film Transistors

5. P-61: Photosensitive Insulating Materials by Organic/Inorganic Hybrid Technologies as a Passivation Layer on TFT LCDs

Cited by 2 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Photo-patternable F-containing acrylic copolymers as passivation materials;Materials Chemistry and Physics;2020-10

2. Direct Photopatternable Organic–Inorganic Hybrid Materials as a Low Dielectric Constant Passivation Layer for Thin Film Transistor Liquid Crystal Displays;The Journal of Physical Chemistry C;2011-11-28

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