Thin-Film Deposition of Silicon-Incorporated Diamond-Like Carbon by Plasma-Enhanced Chemical Vapor Deposition Using Monomethylsilane as a Silicon Source-Reference-Cited by-同舟云学术

Thin-Film Deposition of Silicon-Incorporated Diamond-Like Carbon by Plasma-Enhanced Chemical Vapor Deposition Using Monomethylsilane as a Silicon Source

Published:2008-11-14 Issue:11 Volume:47 Page:8491-8497
ISSN:0021-4922
Container-title:Japanese Journal of Applied Physics
language:en
Short-container-title:Jpn. J. Appl. Phys.

Author:

Nakazawa Hideki,Asai Yuhki,Kinoshita Takeshi,Suemitsu Maki,Abe Toshimi,Yasui Kanji,Itoh Takashi,Endoh Tetsuo,Narita Yuzuru,Konno Atsushi,Enta Yoshiharu,Mashita Masao

Publisher

IOP Publishing

Subject

General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering

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1. Influence of hydrogen gas flow ratio on the properties of silicon- and nitrogen-doped diamond-like carbon films by plasma-enhanced chemical vapor deposition;Diamond and Related Materials;2022-03

2. Diamond Like Carbon Films Containing Si: Structure and Nonlinear Optical Properties;Materials;2020-02-23

3. Effect of discharge power and silicon content on optical and mechanical properties of carbon-rich amorphous silicon carbide films obtained by PECVD;Journal of Alloys and Compounds;2019-09

4. Impacts of substrate bias and dilution gas on the properties of Si-incorporated diamond-like carbon films by plasma deposition using organosilane as a Si source;Thin Solid Films;2018-05

5. Tribological properties and thermal stability of hydrogenated, silicon/nitrogen-coincorporated diamond-like carbon films prepared by plasma-enhanced chemical vapor deposition;Japanese Journal of Applied Physics;2016-10-26