Design and Evaluation of an Electron Objective Lens System with Two Lenses and Two Deflectors
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Published:2002-06-30
Issue:Part 1, No. 6B
Volume:41
Page:4127-4131
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ISSN:0021-4922
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Container-title:Japanese Journal of Applied Physics
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language:en
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Short-container-title:Jpn. J. Appl. Phys.
Author:
Ohta Hiroya,Sohda Yasunari,Saitou Norio
Subject
General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering
Cited by
1 articles.
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1. E-Beam Mask Writers;Handbook of Photomask Manufacturing Technology;2005-04-07