Microcrystalline Silicon Film Growth Using a High-Density Microwave Plasma of SiH4-and-D2Mixture
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Published:2002-12-15
Issue:Part 1, No. 12
Volume:41
Page:7307-7311
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ISSN:0021-4922
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Container-title:Japanese Journal of Applied Physics
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language:en
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Short-container-title:Jpn. J. Appl. Phys.
Author:
Yoshino Koichi,Ohkawara Go,Ueyama Hiroyuki,Shirai Hajime
Subject
General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering