Mechanism Analysis of Thermal/Electric Field Poling in Fused Silica
Author:
Publisher
IOP Publishing
Subject
General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering
Link
http://stacks.iop.org/1347-4065/41/i=5R/a=2958/pdf
Cited by 7 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. SHG in Micron-Scale Layers of Glasses: Electron Beam Irradiation vs. Thermal Poling;Photonics;2022-10-07
2. Thermal poling induced second-order optical nonlinearity in phosphosilicate glass thin films;Journal of Modern Optics;2019-11-15
3. Distribution and Intensity of the Built-in Field in Poled Silica Thermally Based on a Junction Model;Applied Mechanics and Materials;2013-05
4. Theoretical analysis of the depletion layer’s distribution in thermally-poled silica;Journal of the Korean Physical Society;2012-04
5. Second-harmonic generation in the thermal/electrical poling (100−x)GeS2·x(0.5Ga2S3·0.5CdS) chalcogenide glasses;Journal of Physics and Chemistry of Solids;2008-01
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