Effects of N2O Plasma Annealing on the Characteristics of Tantalum Oxide Thin Films Deposited on TaN/Ta Electrode
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Published:2002-12-15
Issue:Part 1, No. 12
Volume:41
Page:7426-7432
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ISSN:0021-4922
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Container-title:Japanese Journal of Applied Physics
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language:en
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Short-container-title:Jpn. J. Appl. Phys.
Author:
Liu Tzu-Ping,Huang Ya-Huang,Chang Chich-Shang,Wu Tai-Bor
Subject
General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering