Reduction Substrate Alkaline Contamination by Utilizing Multi-Layer Bottom Antireflective Coating Structures in ArF Lithography
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Published:2002-06-30
Issue:Part 1, No. 6B
Volume:41
Page:4055-4059
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ISSN:0021-4922
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Container-title:Japanese Journal of Applied Physics
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language:en
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Short-container-title:Jpn. J. Appl. Phys.
Author:
Chen Hsuen-Li,Shih Ming-Chang,Hsieh Ching-Feng,Chen Ben-Chang,Ko Fu-Hsiang
Subject
General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering