Nanometer-Scale Patterning of Polystyrene Resists in Low-Voltage Electron Beam Lithography-Reference-Cited by-同舟云学术

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Nanometer-Scale Patterning of Polystyrene Resists in Low-Voltage Electron Beam Lithography

Published:1997-12-30 Issue:Part 1, No. 12B Volume:36 Page:7773-7776
ISSN:0021-4922
Container-title:Japanese Journal of Applied Physics
language:en
Short-container-title:Jpn. J. Appl. Phys.

Author:

Manako Shoko,Fujita Jun-ichi,Ochiai Yukinori,Nomura Eiichi,Matsui Shinji

Publisher

IOP Publishing

Subject

General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering

Cited by 26 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

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2. Study on Electron-beam-induced Reactions of Methyl α-Allyloxymethyl Acrylic Polymer;Journal of Photopolymer Science and Technology;2018-06-25

3. Grafted Polystyrene Monolayer Brush as Both Negative and Positive Tone Electron Beam Resist;Langmuir;2017-05-09

4. Next generation lithography—the rise of unconventional methods?;Materials and Processes for Next Generation Lithography;2016

5. Effect of molecular weight distribution on e-beam exposure properties of polystyrene;Nanotechnology;2013-05-20

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