Photosensitive Materials on a Base of Polysiloxane for the Alignment of Nematic Liquid Crystals-Reference-Cited by-同舟云学术

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Photosensitive Materials on a Base of Polysiloxane for the Alignment of Nematic Liquid Crystals

Published:1997-09-15 Issue:Part 1, No. 9A Volume:36 Page:5693-5695
ISSN:0021-4922
Container-title:Japanese Journal of Applied Physics
language:en
Short-container-title:Jpn. J. Appl. Phys.

Author:

Yaroshchuk Oleg,Pelzl Gerhard,Pirwitz Grit,Reznikov Yuriy,Zaschke Horst,Kim Jong-Hyun,Kwon Soon Bum

Publisher

IOP Publishing

Subject

General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering

Cited by 22 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Photo-Durable Molecularly Oriented Liquid Crystalline Copolymer Film based on Photoalignment of N-benzylideneaniline;Polymers;2023-03-12

2. Photoreactive self-assembled monolayer for the stabilization of tilt orientation of a director in vertically aligned nematic liquid crystals;Optics Express;2013-12-12

3. Photoalignment and Photoinduced Molecular Reorientation of Photosensitive Materials;Chemistry Letters;2011-06-05

4. A Mean-Field Photoreaction Model for the Pretilt Generation of a Liquid Crystal on Photopolymer Layers upon Ultraviolet Exposure;Japanese Journal of Applied Physics;2011-03-22

5. A Mean-Field Photoreaction Model for the Pretilt Generation of a Liquid Crystal on Photopolymer Layers upon Ultraviolet Exposure;Japanese Journal of Applied Physics;2011-03-01

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