Effect of Activation of Oxygen by Electron Cyclotron Resonance Plasma on the Incorporation of Pb in the Deposition of Pb(Zr,Ti)O3Films by DC Magnetron Reactive Sputtering-Reference-Cited by-同舟云学术

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Effect of Activation of Oxygen by Electron Cyclotron Resonance Plasma on the Incorporation of Pb in the Deposition of Pb(Zr,Ti)O3Films by DC Magnetron Reactive Sputtering

Published:1997-09-15 Issue:Part 1, No. 9A Volume:36 Page:5663-5669
ISSN:0021-4922
Container-title:Japanese Journal of Applied Physics
language:en
Short-container-title:Jpn. J. Appl. Phys.

Author:

Kim Sung-Tae,Kim Hyun-Ho,Kim Yong-Il,Lee Moon-Yong,Lee Won-Jong

Publisher

IOP Publishing

Subject

General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering

Cited by 16 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Morphology of brass films sputtered on celloidin substrate towards high-gloss pigment;Dyes and Pigments;2007-01

2. FERROELECTRIC PROPERTIES OF PZT/TiO2 STRUCTURE ACCORDING TO THE DEPOSITION CONDITION OF TiO2 INTERLAYER;Integrated Ferroelectrics;2005-10

3. Effect of Tb3+ doping on the preferred orientation of lead titanate thin film prepared by sol–gel method on ITO/glass substrates;Surface and Coatings Technology;2005-08

4. Microstructure and Electrical Properties of R.F. Magnetron Sputtering Derived PZT Thin Films Deposited on PbO Buffer Layer;Materials Science Forum;2005-06

5. Microstructure and ferroelectric properties of r.f. magnetron sputtering derived PZT thin films deposited on interlayer (PbO/TiO2);Microchemical Journal;2005-06

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