Study of Interactions of Hf and SiO2Film for High-kMaterials
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Published:2006-08-04
Issue:8A
Volume:45
Page:6253-6255
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ISSN:0021-4922
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Container-title:Japanese Journal of Applied Physics
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language:en
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Short-container-title:Jpn. J. Appl. Phys.
Author:
Chiu Te-Wei,Tanabe Masaaki,Uedono Akira,Hasunuma Ryu,Yamabe Kikuo
Subject
General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering