Stress Reliability Comparison of Metal-Oxide-Semiconductor Devices with CoSi2and TiSi2Gate Electrode Materials
-
Published:2006-02-24
Issue:No. 9
Volume:45
Page:L257-L258
-
ISSN:0021-4922
-
Container-title:Japanese Journal of Applied Physics
-
language:en
-
Short-container-title:Jpn. J. Appl. Phys.
Author:
Wu You-Lin,Lai Min-Yen
Subject
General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering