Improvement in Thermal Stability of Chemical Vapor Deposition CoSi2/Polycrystalline Silicon Using TiN and Amorphous Silicon Interlayers
-
Published:2006-02-08
Issue:2A
Volume:45
Page:710-713
-
ISSN:0021-4922
-
Container-title:Japanese Journal of Applied Physics
-
language:en
-
Short-container-title:Jpn. J. Appl. Phys.
Author:
Hong Jeong Eui,Kim Sun Il,Lee Heui Seung,Ahn Byung Tae
Subject
General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering