Novel Back End-of-Line Process Scheme for Improvement of Negative Bias Temperature Instability Lifetime
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Published:2006-04-07
Issue:4A
Volume:45
Page:2455-2458
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ISSN:0021-4922
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Container-title:Japanese Journal of Applied Physics
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language:en
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Short-container-title:Jpn. J. Appl. Phys.
Author:
Ho Won-Joon,Park Sung-Hyung,Kim Dong-Sun,Han In-Shik,Lee Hi-Deok,Kim Jae-Yeong,Park Yu-Be,Kim Dae-Byung
Subject
General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering