Simulation for Optimization of Mask Error Enhancement Factor by Design of Experiments in Both Dry and Immersion ArF Lithography
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Published:2006-08-04
Issue:8A
Volume:45
Page:6216-6224
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ISSN:0021-4922
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Container-title:Japanese Journal of Applied Physics
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language:en
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Short-container-title:Jpn. J. Appl. Phys.
Author:
Yeh Kwei-Tin,Lin Chih-Hung,Hu Ji-Ren,Loong Wen-An
Subject
General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering